| http://www.w3.org/ns/prov#value | - In accordance with one embodiment of the present invention, an exposure mask for a divisional exposure process is provided, comprising a masking panel; and a slit in the masking panel for selectively transmitting light from a light source, the slit including a taper portion such that an area proximate the taper portion transmits less than full light intensity onto a substrate to be masked.
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