PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Furthermore, the organic resist material is a polymer material, so after exposure and development, the edges of the patterns or the recording pits are likely to be rough, and fine line patterns or recording pits in the level of several nanometers are difficult to be fabricated.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.com