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About:
http://webisa.webdatacommons.org/378416491
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http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value
In various embodiments, the sacrificial layer comprises TiN, TaN, SiN, metal nitride, or other materials that have wet etch selectivity with respect to the silicon oxide material of the ILD layer 140.
http://www.w3.org/ns/prov#wasQuotedFrom
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