| http://www.w3.org/ns/prov#value | - agram of a selective exposure process that can be used to create a laterally patterned diblock copolymer film, in this case, a triangle pattern. [0023]FIG. 3 is a schematic diagram of a selective exposure process that can be used to create a laterally patterned diblock copolymer film, and subsequently can be used to create a laterally patterned nanostructure, in this case, a triangle shaped nanost
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