| http://www.w3.org/ns/prov#value | - Patent US4282268 - Method of depositing a silicon oxide dielectric layer - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More ??Sign inAdvanced Patent SearchPatentsThis invention pertains to a method of depositing a silicon oxide, such as silicon dioxide, dielectric layer on a substrate by utilizing a glow discharge and a dielectric precursor having the formula ##STR1## wherein R1
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