| http://www.w3.org/ns/prov#value | - and said reinforcing plate are to be formed, diffusing boron, performing thermal diffusion to diffuse boron to a deep position, and then forming the patterns of said support, said upper electrode, and said reinforcing plate on said silicon substrate; forming a mask except at positions where said arm is to be formed, diffusing boron, and then forming the pattern of said arm on said silicon substrat
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