| http://www.w3.org/ns/prov#value | - adiation from an excimer laser through a mask to expose selectively the resist material to pulsed UV laser radiation, in the presence of a photoreactive etchant, and thereby to etch exposed portions of the resist, maintaining a controlled ambient environment of the resist material, by steps including maintaining the coated substrate in an inert gas environment, to avoid oxidation and exposure to c
|
