| http://www.w3.org/ns/prov#value | - arranging an insulating substrate on a grounded second electrode of a sputtering apparatus including a first electrode formed of a target material disposed opposed to the insulating substrate and a magnet disposed on a back surface of the first electrode; depositing by sputtering on the insulating substrate a thin film of an aluminum or an aluminum alloy comprising more than 70 atomic percentage a
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