| http://www.w3.org/ns/prov#value | - Patent US6437350 - Methods and apparatus for adjusting beam parallelism in ion implanters - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More ??Sign inAdvanced Patent SearchPatentsMethods and apparatus for implanting ions in a workpiece, such as a semiconductor wafer, include generating an ion beam, measuring parallelism of the ion beam, adjusting the ion beam for a desired paral
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