| http://www.w3.org/ns/prov#value | - and 5B show a variable mask device for crystallizing a silicon layer according to the present invention; FIG. 6 is sectional view showing an SLS method using the variable mask device for crystallizing a silicon layer according to the present invention; and FIG. 7 is a plan view showing a method for crystallizing a substrate by using a laser beam generating device including the variable mask device
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