| http://www.w3.org/ns/prov#value | - Patente US5940714 - Method of fabricating a capacitor electrode structure in integrated circuit ... - Google PatentesB???squeda Im???genes Maps Play YouTube Noticias Gmail Drive M???s ??Iniciar sesi???n B???squeda avanzada de patentesPatentesA semiconductor fabrication method is provided for fabricating a capacitor electrode structure in an integrated circuit such as a DRAM (dynamic random-access
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