| http://www.w3.org/ns/prov#value | - a failure rate. [0014] As a method of inspecting a semiconductor device by electron beam, for example, there is a method of finely focusing electron beam of very small current as in a length measuring SEM, irradiating the electron beam to a wafer and forming an image to thereby observe a very fine shape and measure a line width, however, although the shape can be observed, failure of junction leak
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