| http://www.w3.org/ns/prov#value | - Said method is characterised in that: (a) it optionally consists of a step of pre-cleaning substrate layer (A) and/or substrate layer (B), by oxidising or reducing continuous atmospheric cold plasma processing pre-cleaning; (b) the plasma is either (i) oxidising or reducing when the layer is a polymer layer having a shore D of strictly between 35 and 60 or when the layer is a polymer layer having
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