| http://www.w3.org/ns/prov#value | - 97May 18, 1999Altera CorporationMethod of making scalable tunnel oxide window with no isolation edgesUS6017792 *May 22, 1996Jan 25, 2000Motorola, Inc.Process for fabricating a semiconductor device including a nonvolatile memory cell* Cited by examinerClassifications U.S. Classification257/318, 257/321International ClassificationH01L27/02Cooperative ClassificationH01L27/11519, H01L27/0203European C
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