| http://www.w3.org/ns/prov#value | - gh a photomask bearing a desired pattern followed by development using a developing solution such as an aqueous solution of an organic base such as tetramethyl ammonium hydroxide and choline in a concentration of 2 to 5% by weight so that the photoresist layer is selectively dissolved away on the areas where the photoresist composition has been imparted with increased solubility in the developing
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