| http://www.w3.org/ns/prov#value | - g line gratingsUS7592255 *22 Dec 200422 Sep 2009Hewlett-Packard Development Company, L.P.Fabricating arrays of metallic nanostructuresUS760483613 Dec 200620 Oct 2009Hitachi Global Storage Technologies Netherlands B.V.Release layer comprised of perfluoropolyether diacrylate material is formed on master tool and stamper tool which are used to form patterns in resist material, such as hole or pillar
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