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http://webisa.webdatacommons.org/383475904
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http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value
The dummy gate region, which may be composed of an oxide, is formed by a conventional deposition process such as CVD and the planarization process may include CMP or another conventional planarization technique.
http://www.w3.org/ns/prov#wasQuotedFrom
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