About: http://webisa.webdatacommons.org/384010268

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The dry etching to be employed in the present invention may be performed by using various kinds of dry etching methods and apparatus such as ECR, parallel plate magnetron, DMR, ICP and double-frequency type RIE.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com