| http://www.w3.org/ns/prov#value | - The implant process 38 may employ a lightly-doped doping (LDD) step and an optional pocket implant step, wherein the lightly-doped doping (LDD) step and a pocket implant step are conducted perpendicular to the surface of the substrate 10 and employ, for example, P-type dopants such as boron (B) or BF2.
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