| http://www.w3.org/ns/prov#value | - Advanced Micro Devices, Inc. (Sunnyvale, CA)International Classification: G03C 556U.S. Classification: 430313, 430 30, 430317, 430950, 430396, 430394, 356369Abstract: Critical dimension variation of photolithographically formed features on a semiconductor substrate is reduced by measuring the reflectivity of a photoresist layer and an underlying layer, such as a polysilicon layer, and adjusting th
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