http://www.w3.org/ns/prov#value | - Additionally, conformal coverage of the metal mesh by the conventional or conductive polishing material may allow the use of materials, such as copper which has a resistivity of 1.6 ????-cm at 0??? C., that may be consumed if exposed to ECMP processing. [0094] The conductive polishing article 610 with the metal mesh may be manufactured by forming a pattern in the first conventional polishing mater
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