About: http://webisa.webdatacommons.org/388054531

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Subsequently, a planarization process such as CMP or etchback is performed to expose a top surface of the lower insulating pattern 121, thereby forming the bottom electrode 163.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com