About: http://webisa.webdatacommons.org/389092958

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	etching at least the second semiconductor layer by using the second mask to form a third semiconductor layer including a second eaves portion, the second eaves portion projecting beyond the sides of the gate electrode; and
http://www.w3.org/ns/prov#wasQuotedFrom	google.ca