| http://www.w3.org/ns/prov#value | - After the wafer W is transferred to the aligner 5, the shutter 68 is closed again. [0049] While the wafer W is transferred from the gas supply unit 43 to the aligner 5, the protective film 61 protects not only the surface of the resist film 60 but also the wafer W itself and prevents impurities such as oxygen, ozone, and water vapor, and particulates from adhering thereto.
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