| http://www.w3.org/ns/prov#value | - After that, a thin film (thin film formed of a semiconductor material, an insulating material, or a conductive material) which is present except in a portion to be a semiconductor layer or a wiring is etched to be removed using the resist mask as a mask, thereby the semiconductor layer or the wiring is formed (Reference 1: Japanese Published Patent Application No. 05-144812).
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