About: http://webisa.webdatacommons.org/393825241

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	As is shown in FIG. 52, using the pattern-transferred photoresist as a mask, anisotropic etching such as RIE is conducted, thereby transferring the pattern 42-2 on the protection film.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com.au