PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • As a process for preparing an inorganic insulating film to which the present invention can be applied, a low pressure CVD process, a plasma CVD process and other processes can be used.
http://www.w3.org/ns/prov#wasQuotedFrom
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