| http://www.w3.org/ns/prov#value | - In some embodiments, the passivation layer 180 preferably comprises a photosensitive organic material having a good flatness characteristics, a low dielectric insulating material such as a-Si:C:O or a-Si:O:F (which may be formed by PECVD), or an inorganic material such as silicon nitride or silicon oxide.
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