| http://www.w3.org/ns/prov#value | - In embodiments, described herein is a method of measuring the amount of wax on the surface of EA toner particles as atomic percent surface oxygen by XPS. XPS is a surface analysis technique that provides elemental, chemical state, and quantitative analysis of from about 1 nm to about 7 nm of a toner particle's surface, such as from about 2 nm to about 5 nm of a toner particle's surface.
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