About: http://webisa.webdatacommons.org/394914176

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Referring to FIG. 5 b, the oxide layer 88 which is not covered by the photoresist mask 89 is thinned by a process such as a timed etch in a buffered HF solution.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com