PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • The overlay of the gate structure 419 over the insulating layer 415, the third well 411, and/or the drift region 407 is achieved by a process including photolithography patterning and etching.
http://www.w3.org/ns/prov#wasQuotedFrom
  • freshpatents.com