About: http://webisa.webdatacommons.org/396714936

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is an apparatus and method for inductively coupling electrical power to a plasma in a semiconductor process chamber.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es