PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Therefore, the apparatus of the present invention can be used to deposit various types of films or different substrates and does so by an ion beam technique, wherein the degree and uniformity of deposition are controlled.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.fr