| http://www.w3.org/ns/prov#value | - A method of forming a positive polyimide pattern on a substrate, the steps which comprise:(a) preparing an actinic radiation-sensitive polyimide precursor composition comprising a polymer (A) and a compound (B), said polymer (A) having the structural unit represented by the general formula (1) as the main constituent, ##STR2## wherein R1 is a trivalent or tetravalent organic group having at least
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