| http://www.w3.org/ns/prov#value | - A method for forming a multicomponent or multilayer metal film on a substrate by atomic layer deposition comprising subjecting said substrate to a sequence of alternating pulses of four or more different gases, wherein one of said gases comprises a metal nitrate-containing precursor, another of said gases is an inert gas, another of said gases is a reducing agent and another of said gases is a met
|
