| http://www.w3.org/ns/prov#value | - A method to fabricate a pixel sensor cell according to an embodiment of the invention will be described with reference to FIGS. 3A-3E. As shown in FIG. 3A, there is provided a substrate 15 which may be a bulk semiconductor including, for example, Si, SiGe, SiC, SiGeC, GaAs, InP, InAs and other semiconductors, or layered semiconductors such as silicon-on-insulators (SOI), SiC-on-insulator (SiCOI) o
|
