| http://www.w3.org/ns/prov#value | - A method of forming an insulating film upon a select region of a sample comprising the steps of:providing a gaseous vapor consists essentially of a compound including principal elements for the desired insulating film, wherein the desired insulating film is a silicon oxide film and said compound consists of a single compound selected from the group consisting of tetrabutoxysilane, Si(OC4 H9)4, tet
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