| http://www.w3.org/ns/prov#value | - A method of fabricating a microswitch according to claim 27, said method comprising steps of: forming a mask at the position of a silicon substrate where said support is to be formed and using an etching solution to etch the entire surface of said silicon substrate other than the position at which said support is formed; forming a mask except at positions where said support, said upper electrode,
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