PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • After a polysilicon layer 260 with a thickness of about 500???1000 ??? is conformably deposited, a planarization process, such as CMP, is applied to remove the insulating layer 254 of the cell area.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.com