About: http://webisa.webdatacommons.org/399692180

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	FIG. 7 is a graphic illustration of the relationship between etching rate and selectivity on silicon oxide layers while varying the mixing ratio between C3 F8 and Ar in a reactive ion etching system.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com