About: http://webisa.webdatacommons.org/405730155

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present composition is exceptionally useful as a photoresist remover, stripper or cleaner by applying the composition to either exposed or unexposed, i.e. cured or uncured photoresist on surfaces or substrates.
http://www.w3.org/ns/prov#wasQuotedFrom	docstoc.com