About: http://webisa.webdatacommons.org/40728529

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In this case, gas such as CF4, SF6, Cl2, BCl2, and O2 is used as etching gas for the etching process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com