| http://www.w3.org/ns/prov#value | - The layer insulating film 63 is formed of a silicon oxide-based insulating film (e.g., a three-layered insulating film of a silicon oxide film, an SOG film and a silicon oxide film), and similarly to the second layer wiring lines 52, 53, the third layer wiring lines 57, 58 and 59 are formed of a conductive film made mainly of Al.
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