About: http://webisa.webdatacommons.org/411665067

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is a technique relating to a method of manufacturing a semiconductor device utilizing a crystalline semiconductor thin film containing silicon as a main component.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com