About: http://webisa.webdatacommons.org/413291564

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	A material for the resist film 4 is desirably suitable for a process such as etching which is executed after the nano imprint process depending on the high-density recording media to be produced.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com