| http://www.w3.org/ns/prov#value | - It provides in particular a chemical vapor deposition reactor (chemical vapor deposition: CVD) and may in particular be applied to the production of electronic components or integrated circuits: coating of circuit boards with thin film conductors, semi-conductors or insulators (for example the formation or doping of epitaxial, polycrystalline or amorphous films of materials such as silicon, germ
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