About: http://webisa.webdatacommons.org/41667883

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In a preferred embodiment the mask layer is composed of a photoresist, therefore the mask layer is preferably removed by a dry etch, wet chemical etch or other process appropriate to photoresist removal.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es