PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • As shown in FIG. 1, inner chamber wall 10 is a portion of a wall, or a component, of a processing chamber that may be used for FSG deposition commonly used to form inter metal dielectric (IMD) layers over a wafer within the chamber.
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