| http://www.w3.org/ns/prov#value | - On the other hand, in autofocusing or auto-leveling in a slit scan type exposure apparatus, a wafer moves during the exposure process and, for this reason, there is a possibility that, in accordance with the rate determination by the response speed of a focus plane detection system and of a wafer stage height (wafer height) driving system, a following-up error (i.e., focus error) is created.
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