About: http://webisa.webdatacommons.org/418373222

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Upon completion of the trench formation, a masking layer or other protective material for dry etching silicon is applied to the substrate 32 to protect the silicon material during the dry etch process as described above.
http://www.w3.org/ns/prov#wasQuotedFrom	google.ca